18–26 Sept 2025
Ito International Research Center
Asia/Tokyo timezone

Commissioning of chemical vapor deposition system for superconducting thin films

MOP21
22 Sept 2025, 14:30
3h
Ito International Research Center

Ito International Research Center

Tokyo
Board: MOP21
Student Poster Presentation MC2: Fundamental SRF research and development Monday Poster Session

Speaker

Alexis Grassl (Cornell University)

Description

Next-generation, thin-film surfaces employing Nb3Sn, NbN, NbTiN, or other compound superconductors are essential for reaching enhanced RF performance levels in SRF cavities. However, optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University developed and commissioned a chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a high-vacuum, gas, and precursor delivery system. Here, we present the commissioned system with the control aspects and safety considerations addressed and the materials we are interested in growing.

Footnotes

Both G. Gaitan and A. Grassl are primary authors of this contribution.

Funding Agency

This work was supported by the U.S. National Science Foundation under Award PHY-1549132, the Center for Bright Beams.

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Author

Gabriel Gaitan (Cornell University)

Co-authors

Alexis Grassl (Cornell University) Adam Holic (Cornell University) Will Howes (Cornell University) Greg Kulina (Cornell University) Matthias Liepe (Cornell University) Caleb Middleton (Cornell University) Peter Quigley (Cornell University) James Sears (Cornell University) Nathan Sitaraman (Cornell University)

Presentation materials

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