17–22 May 2026
C.I.D
Europe/Zurich timezone

Study of the Emissivity of Copper Oxide Thin Films by Cylindrical Magnetron Sputtering

TUP7694
19 May 2026, 16:00
2h
C.I.D

C.I.D

Deauville, France
Poster Presentation MC7.T14: Vacuum Technology Poster session

Speaker

Yi-Chen Yang (National Synchrotron Radiation Research Center)

Description

High-energy electron beams operating in accelerator vacuum chambers can easily cause heat accumulation on the surfaces of in-vacuum components. When convective cooling and effective conductive heat dissipation are limited, the thermal radiation capability of material surfaces becomes an important heat dissipation mechanism. In this study, copper oxide (CuO) thin films were deposited on Oxygen-Free Copper (OFC) substrates to investigate their enhancement of surface thermal radiation char-acteristics. Experimental results show that the prepared CuO films exhibit dense columnar grain structures with a monoclinic CuO (002) preferred orientation. Emissivity measurements indicate that the average high-temperature emissivity of bare OFC substrates is approximately 0.1, while CuO-coated samples can achieve values up to 0.52, demonstrating improved infrared thermal radiation performance. The coating system setup, experimental procedures, and emissivity measurement methods will be fur-ther described in this paper.

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Author

Bo-Ying Chen (National Synchrotron Radiation Research Center)

Co-authors

Chin Shueh (National Synchrotron Radiation Research Center) Jing-hao Kang (National Synchrotron Radiation Research Center) Che-Kai Chan (National Synchrotron Radiation Research Center) Chin-Chun Chang (National Synchrotron Radiation Research Center) Yi-Chen Yang (National Synchrotron Radiation Research Center) Chia-Mu Cheng (National Synchrotron Radiation Research Center)

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