16–21 Aug 2026
Daejeon Convention Center
Asia/Seoul timezone

Plasma processing for mid-T baked cavity at SARI

Not scheduled
2h
Daejeon Convention Center

Daejeon Convention Center

107 Expo-ro, Yuseong-gu, Daejeon (34125) South Korea
Poster Presentation MC4.A08: Superconducting RF Poster Session

Speaker

Wentian Xue (Shanghai Institute of Applied Physics)

Description

In this study, we conduct plasma processing experiments to improve performance of hydrocarbon contaminated mid-T baked cavities. Field emission is one of the main factors that limit performance of superconducting radiofrequency cavities. To mitigate the impact of FE, we conducted experimental research on a dedicated mid-T baked 1.3 GHz single-cell cavity equipped with two higher order mode couplers. Our study initiated with the cleaning of carbon-based permanent marker stains, followed by cleaning ethanol contamination. The first experiment was time-consuming but yielded an intuitive result: after around 105 hours of plasma cleaning with RF power input through a HOM coupler, the area covered by marker stains was significantly reduced. The second experiment utilized an ethanol/neon gas mixture to excite plasma within the cavity, enabling ethanol deposition on the cavity surface, followed by plasma processing. The results showed significant changes in the cavity performance before and after processing. This study demonstrates that plasma processing can restore cavity performance while maintaining the high-Q characteristics of mid-T baked SRF cavities and significantly reduce FE.

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Author

Wentian Xue (Shanghai Institute of Applied Physics)

Co-authors

Jinfang Chen (Shanghai Advanced Research Institute) Yue Zong (Shanghai Advanced Research Institute) Zheng Wang (Shanghai Institute of Applied Physics)

Presentation materials

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