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Description
In order to enhance the coating quality of tantalum-based electroplated nickel targets for the production of ⁶⁴Cu radionuclides, and to address issues such as thin and easily detachable nickel coatings in conventional targets, this study systematically investigated the pretreatment processes of tantalum substrates, the composition of the plating bath, and electroplating parameters. The effects of pretreatment methods, pH of the plating bath, surfactant concentration, current density, temperature, and agitation rate on the quality of the nickel coating were examined. The fabricated targets were subsequently characterized through metallographic examination, drop tests, and thermal shock experiments. Results demonstrated that under ambient temperature conditions, by adjusting the plating bath pH to 9.80 with ammonia, maintaining a sodium dodecyl sulfate concentration of 15 mg/L, applying a current density of 3 mA/cm², an agitation rate of 200 r/min, and an electroplating duration of 2 hours, a high-quality tantalum-based electroplated nickel target suitable for accelerator-based ⁶⁴Cu production was achieved. The resulting coating exhibited a thickness of 20.87 mg/cm², with excellent uniformity, adhesion, and thermal stability. Additionally, the utilization efficiency of Ni²⁺ in the plating bath reached 60%.
