Speaker
Tianlong He
(University of Science and Technology of China)
Description
To coat the inner surface of antechamber type vacu-um chamber for Hefei Advanced Light Facility (HALF) with nonevaporable getter (NEG) fillm, a dedicated magnetron sputtering setup has been prepared at National Synchrotron Radiation Laboratory (NSRL). The magnetron sputtering device and the coating method are introduced in this paper. The properties of the films were tested. This coating method has been proved to be feasible and ensures the stability of the discharge and the reliability of the NEG film quality, which satisfy the stringent engineering requirements of HALF. This study may also offer a reference for similar vacuum chamber coating applications.
| Paper status | Resubmitted proceeding files received and assigned to an editor. Ready for Review. |
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Author
Bowen Yao
(University of Science and Technology of China)
Co-authors
Tao Huang
(University of Science and Technology of China)
Wenli Zhang
(University of Science and Technology of China)
le fan
(University of Science and Technology of China)
yuanzhi hong
(University of Science and Technology of China)
Xiaoqin Ge
(University of Science and Technology of China)
Tianlong He
(University of Science and Technology of China)