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The generation of high intensity ion beams requires high density plasma in the ion source. Earlier studies have shown how high plasma densities can be achieved with a combined RF- and arc-discharge without using a filament as an electron emitter.
Previous observations have shown how space charge compensation in ion source extraction systems has significant benefits for high intensity ion beam extraction.
In conventional extraction systems however the compensating electrons need to be blocked from entering the extraction region by means of a suppression voltage to prevent sparking in the high voltage gap.
Therefore we propose the controlled use of a separately produced electron beam to compensate space charge right at the extraction gap.
The concept of achieving superposition of electron and ion beam by propagating the e- beam through the plasma generator chamber is evaluated. First beam dynamics simulations for the electron beam as well as extraction studies for the compensated and non-compensated case are presented.
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