Speaker
Dmitry Bazyl
(Deutsches Elektronen-Synchrotron DESY)
Description
We describe a procedure for fabricating a copper photocathode plug with high optical surface quality. A spatially localized nanostructured emission zone (50 µm) was formed using focused ion beam lithography on a bulk single-crystal Cu(100) substrate, which proved essential for maintaining the structural uniformity of the pattern. Although modulated cathode surfaces are generally associated with dark current risks, testing in a normal-conducting S-band RF gun showed no measurable dark current at field gradients up to 70 MV/m.
Funding Agency
Work performed in the framework of R&D for future accelerator operation modes at the European XFEL and financed by the European XFEL GmbH.
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Author
Dmitry Bazyl
(Deutsches Elektronen-Synchrotron DESY)