17–22 May 2026
C.I.D
Europe/Zurich timezone

Fabrication and Testing of a Nanostructured Copper Photocathode

THP2131
21 May 2026, 16:00
2h
C.I.D

C.I.D

Deauville, France
Poster Presentation MC2.T02: Photon sources: Electron Sources Poster session

Speaker

Dmitry Bazyl (Deutsches Elektronen-Synchrotron DESY)

Description

We describe a procedure for fabricating a copper photocathode plug with high optical surface quality. A spatially localized nanostructured emission zone (50 µm) was formed using focused ion beam lithography on a bulk single-crystal Cu(100) substrate, which proved essential for maintaining the structural uniformity of the pattern. Although modulated cathode surfaces are generally associated with dark current risks, testing in a normal-conducting S-band RF gun showed no measurable dark current at field gradients up to 70 MV/m.

Funding Agency

Work performed in the framework of R&D for future accelerator operation modes at the European XFEL and financed by the European XFEL GmbH.

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Author

Dmitry Bazyl (Deutsches Elektronen-Synchrotron DESY)

Presentation materials

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