Speakers
Description
Low-loss ultraviolet (UV) transverse shaping has emerged as a critical enabling technology for modern photoinjectors, with fused-silica phase-plates offering a robust alternative to conventional shaping methods. Building on our NAPAC2025 work, we introduce a new generation of enhanced UV phase-plates that use genetically seeded structured-stochastic designs and multi-level nanofabrication. These designs are initialized using spiral-zone-plate phase patterns and yield smoother transverse profiles at the photocathode while further reducing normalized emittance.
At LCLS-I, these phase-plates achieve a 25% emittance reduction (0.6 um to 0.45 um); beating expectations of 20% reduction predicted by Impact-T simulations. For AWA, we fabricated 2-inch fused-silica masks compatible with the upgraded gun and beamline optics. Leveraging multi-level nanofabrication capabilities at the Center for Nanoscale Materials, we produced plates with reduced phase quantization error, enabling high-quality shaping.
These results broaden the design space for low-emittance, jitter controlled photoinjector operation demonstrating the maturation of passive UV beam shaping into a facility-ready technology.
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