Description
To coat the inner surface of antechamber type vacu-um chamber for Hefei Advanced Light Facility (HALF) with nonevaporable getter (NEG) fillm, a dedicated magnetron sputtering setup has been prepared at Na-tional Synchrotron Radiation Laboratory (NSRL). The magnetron sputtering device and the coating method are introduced in this paper. Three types of antechamber type vacuum chambers proposed in the initial stage of engineering design were attempted to be coat-ed, and all were successful. This coating method has been proved to be feasible and ensures the stability of the discharge, which satisfy the stringent engineering requirements of HALF. This study may also offer a reference for similar vacuum chamber coating applications.
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Author
Bowen Yao
(University of Science and Technology of China)
Co-authors
Tao Huang
(University of Science and Technology of China)
le fan
(University of Science and Technology of China)
Wenli Zhang
(University of Science and Technology of China)
Tianlong He
(University of Science and Technology of China)
yuanzhi hong
(University of Science and Technology of China)
Xiaoqin Ge
(University of Science and Technology of China)