Speaker
Description
Maintaining an ultra-high vacuum (UHV) environment is essential for the Hefei Advanced Light Facility (HALF) to achieve its design performance. Owing to the dimensional limitations imposed by small-aperture vacuum chambers, non-evaporable getter (NEG) films are commonly applied to the inner walls to enhance vacuum performance. However, conventional NEG films increase the resistive-wall impedance of the vacuum pipes, there-by exacerbating the wakefield effects. To address this problem, a novel composite film, Al-TiZrV, has been developed. By covering the TiZrV film surface with a highly conductive film, it can reduce the resistivity of the composite film. The results show that while the addition of the Al layer reduces the resistivity significantly, it increases the secondary electron yield (SEY), exacerbating the electron cloud effect. This study provides insights into the complex properties of similar bilayer films for future research on accelerator-related materials.
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