Speaker
Description
The use of amorphous carbon (a-C) coatings in particle accelerators has grown significantly over the past decade. Initially developed to reduce secondary electron yield (SEY) and mitigate electron multipacting in the CERN SPS, where more than 200 quadrupole beam pipes are coated to improve beam stability, a-C films are now being implemented in high-intensity machines such as the HL-LHC at CERN and the EIC at BNL. In these facilities, they aim to suppress electron-cloud formation and reduce heat loads to cryogenic systems. This contribution reviews the key properties of low SEY a-C films, focusing on carbon bonding and the impact of impurities and deposition parameters. It then summarizes coating technologies and implementation strategies for accelerator components, including the design of deposition sources, adhesion enhancement, gas purity, and geometric constraints, with emphasis on in-situ deposition. Emerging applications are also outlined, such as combining controlled surface resistance with low SEY for ceramic components in HL-LHC kicker magnets and optimizing polarized gas-target cells for fixed-target experiments like LHCspin.
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