Speaker
Description
Techniques for generating light with particle accelerators have so far proven difficult to industrialize. Accelerator-based light sources are typically housed at universities and national laboratories, which prioritize fundamental scientific discovery over economic and operational considerations like cost efficiency and 24/7 consistency. By contrast, EUV lithography in semiconductor manufacturing relies on laser-produced plasma (LPP) sources - a dependable but mature technology whose limited output power and inability to operate at shorter wavelengths constrain the industry. An accelerator-based EUV light source could be transformative for the industry, but efforts to date have yet to yield a practical solution. This talk reviews past and ongoing attempts to develop accelerator-based light sources for semiconductor manufacturing and introduces a concept under exploration at SLAC National Accelerator Laboratory – the isochronous induction-cell storage ring - which may enable coherent emission of EUV light via steady-state microbunching (SSMB).
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