Speaker
Yue Zong
(Shanghai Institute of Applied Physics)
Description
A surface treatment device has been established at the Wuxi Platform, enabling chemical polishing treatment on coupon samples. Currently, several samples treated with buffered chemical polishing (BCP) have been utilized in the investigation of nitrogen doping and medium-temperature baking mechanisms. This paper presents the development process of this device along with the experimental outcomes. In the future, we plan to enhance the device to facilitate electropolishing (EP) treatment on coupon samples.
| Region represented | Asia |
|---|---|
| Paper preparation format | LaTeX |
Primary author
Yue Zong
(Shanghai Institute of Applied Physics)
Co-authors
Dong Wang
(Shanghai Advanced Research Institute)
Jiani Wu
(Shanghai Advanced Research Institute)
Jinfang Chen
(Shanghai Advanced Research Institute)
Shuai Xing
(Shanghai Advanced Research Institute)
Zheng Wang
(Shanghai Institute of Applied Physics)
