19–24 May 2024
Music City Center
US/Central timezone

Improving the uniformity of magnetron sputtering titanium film for nonlinear injection kicker

THPS25
23 May 2024, 16:00
2h
Blues (MCC Exhibit Hall A)

Blues

MCC Exhibit Hall A

Poster Presentation MC7.T35 Advanced Manufacturing Technologies for Accelerator Components Thursday Poster Session

Speaker

Wei-Yang Lai (National Synchrotron Radiation Research Center)

Description

The design and manufacturing of the Nonlinear Injection Kicker is one of the upgrade project for the Taiwan Photon Source (TPS). In accordance with the requirements of the developed ceramic vacuum chamber, it is necessary to apply a uniform titanium coating on the inner surface of the ceramic substrate to reduce the impedance and image current observed by the stored electron beam. Therefore, titanium films must be sputtered onto a 30 cm × 6 cm ceramic substrate, and these films must exhibit excellent uniformity. Based on our tests of sputtering titanium films on ceramic substrate, the uniformity of the titanium film can be controlled within 5%. The adhesion between the ceramic substrate and the titanium films meets the highest level of ASTM-D3359 5B standard, with an adhesive strength reaching 40 MPa. This paper describes the detailed manufacturing processes and testing results.

Region represented Asia
Paper preparation format Word

Primary author

Chun-Shien Huang (National Synchrotron Radiation Research Center)

Co-authors

Bo-Ying Chen (National Synchrotron Radiation Research Center) Chia-Jui Lin (National Synchrotron Radiation Research Center) Chien-Kuang Kuan (National Synchrotron Radiation Research Center) Tse-Chuan Tseng (National Synchrotron Radiation Research Center) Wei-Yang Lai (National Synchrotron Radiation Research Center)

Presentation materials

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