Speaker
Description
The non-evaporable getter (NEG) film deposited on the inner wall of the vacuum chamber using magnetron sputtering has been widely used in the fourth-generation synchrotron radiation light source to obtain and maintenance ultra-high vacuum in narrow vacuum chambers. The IAU vacuum chamber has a small cross-sectional size and a long length . It also needs to deposit a NEG film to meet the needs of ultra-high vacuum. Due to the limitation of cross-sectional size, it is difficult to obtain magnetron sputtering discharge and optimal coating parameters through experiments. In order to obtain clear discharge boundaries and optimal discharge parameters, the PIC-MCC method is used to conduct numerical simulations to determine the boundaries of discharge parameters. Taking a reasonable shell thickness and a lower discharge voltage as optimization goals, the optimal discharge parameters are determined and an experimental device is established. The spectral changes of Kr I and Kr II are measured with a spectrometer to verify the reliability of the numerical simulation and provide theoretical and data support for the next step of engineering coating implementation.
| Region represented | Asia |
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