Speaker
Huan Wang
(Tsinghua University)
Description
Optical enhancement cavity (OEC) provides the high intensity and high stability modulation laser field in steady-state microbunching (SSMB) light source. An SSMB extreme ultraviolet (EUV) light source targeted for lithography application is currently being developed at Tsinghua University, which demands for megawatt scale intra-cavity power for OEC. Cavity mirrors are the key components of the OEC to realize its designed parameters. Here we report the development progress of the cavity mirrors.
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Author
Huan Wang
(Tsinghua University)
Co-authors
Chuanxiang Tang
(Tsinghua University)
Lixin Yan
(Tsinghua University)
Renkai Li
(Tsinghua University)
Wenhui Huang
(Tsinghua University)
Xing Liu
(Tsinghua University)
Xinyi Lu
(Tsinghua University)
