Speaker
Huan Wang
(Tsinghua University in Beijing)
Description
Optical enhancement cavity (OEC) provides the high intensity and high stability modulation laser field in steady-state microbunching (SSMB) light source. An SSMB extreme ultraviolet (EUV) light source targeted for lithography application is currently being developed at Tsinghua University, which demands for megawatt scale intra-cavity power for OEC. Cavity mirrors are the key components of the OEC to realize its designed parameters. Here we report the development progress of the cavity mirrors.
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Author
Huan Wang
(Tsinghua University in Beijing)
Co-authors
Chuanxiang Tang
(Tsinghua University in Beijing)
Lixin Yan
(Tsinghua University in Beijing)
Renkai Li
(Tsinghua University)
Wenhui Huang
(Tsinghua University in Beijing)
Xing Liu
(Tsinghua University in Beijing)
Xinyi Lu
(Tsinghua University in Beijing)
