7–12 May 2023
Venice, Italy
Europe/Zurich timezone

Origins of Quench in Buffered Chemical Polished and Low Temperature Baked SRF Cavities

SUPM091
7 May 2023, 14:00
4h
Sala Mosaici 2

Sala Mosaici 2

Poster Presentation Student Poster Session

Speaker

Hannah Hu (University of Chicago)

Description

Electropolishing (EP) and buffered chemical polishing (BCP) are conventional surface preparation techniques for superconducting radiofrequency (SRF) cavities that remove damaged material from the cavity surface. One main issue with EP and BCP treated SRF cavities is high field Q-slope (HFQS), a drop in quality factor at high gradients that limits quench field. High gradient performance in EP cavities can be improved by applying a low temperature bake (LTB), but LTB does not consistently remove HFQS in BCP cavities. There is no consensus as to the why LTB is not effective on BCP prepared cavities, and the cause of HFQS in BCP cavities is not well understood. We examine the origins of quench in EP, BCP, EP+LTB, and BCP+LTB treated SRF cavities. We also show the effect of these treatments on the onset of HFQS, heating within the cavity up to quench, concentration of free hydrogen, and surface roughness.

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Primary author

Hannah Hu (University of Chicago)

Co-authors

Daniel Bafia (Fermi National Accelerator Laboratory) Young-Kee Kim (University of Chicago)

Presentation materials

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