7–12 May 2023
Venice, Italy
Europe/Zurich timezone

Latest PANTECHNIK’s ECR ion sources performances

TUPA124
9 May 2023, 16:30
2h
Salone Adriatico

Salone Adriatico

Poster Presentation MC3.T01: Proton and Ion Sources Tuesday Poster Session

Speaker

Ambra Morana (PANTECHNIK)

Description

Electron Cyclotron Resonance Ion Sources (ECRIS) are commonly used as injectors in many accelerator laboratories and industries and therefore, pushing its limit towards very high charge state and intense ions for nuclear and elementary particle physics and low charge state ions for surface treatments & medical purposes. For these applications, several models of ECRIS were designed and developed by PANTECHNIK.
This article presents a short description of the latest ECR ion source models delivered to the clients along with their typical beam intensities of low and high charge states of various elements.
A focus will be made on our latest Supernanogan source (14.5GHz) which has just been installed at INSP, France. We will present improvements of highly charged ion production as a function of time and the efficiency of the new gas injection design.

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Primary author

Ambra Morana (PANTECHNIK)

Co-authors

Vincent Bertrand (PANTECHNIK) Matthieu Cavellier (PANTECHNIK) David Zanuttini (PANTECHNIK) Emily Lamour (Institut des NanoSciences de Paris) Stéphane Macé (Institut des NanoSciences de Paris) Christophe Prigent (Institut des NanoSciences de Paris) Sebastien Steydli (Sorbonne University)

Presentation materials

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