Speaker
Description
Recently we have developed a new NEG, oxygen-free Pd/Ti. The initial pumping speeds of the oxygen-free Pd/Ti thin film after baking at 150 °C were estimated to be 3.2 L s–1 cm–2 for H2 and 7.6 L s–1 cm–2 for CO at room temperature. The oxygen-free Pd/Ti deposition for vacuum chambers and components in soft X-ray beamlines of synchrotron radiation (SR) facility seems to be ideal because it can be partially activated by baking at 75 °C for 6 h , and its pumping speed does not decrease in the pressure region below 10–8 Pa. We applied oxygen-free Pd/Ti deposition for the first mirror (M1) test chamber of a soft X-ray branch in a new beamline BL-11 in the Photon Factory 2.5 GeV ring (Tsukuba, Japan). Then the mirror and mirror holder system were installed in the M1 test chamber. After pumping and baking at 90–110 °C for 52 hours, the pressure in the M1 test chamber reached 6.9 × 10–8 Pa. When the M1 test chamber was isolated from TMP the pressure was maintained at ca. 5 × 10–7 Pa. Analysis of residual gases in the oxygen-free Pd/Ti deposition M1 test chamber showed that amount of hydrocarbons were below detection limits and that major of the residual gas was H2.
Funding Agency
This work was partly supported by KAKENHI (22K04937) and TIA-Kakehashi grants (TK23-004 and TK24-002).
