Stitching Fizeau interferometry for X-ray optics metrology at MAX IV

WEP57
17 Sept 2025, 17:00
1h
Poster Session Room (The Loop)

Poster Session Room

The Loop

Poster Presentation Optics Wednesday Poster Session

Speaker

Maxime Lebugle (MAX IV Laboratory)

Description

Precise metrology of synchrotron optics is essential for maintaining the performance of X-ray beamlines at diffraction-limited storage rings. We are developing a stitching Fizeau interferometer system designed to measure large synchrotron X-ray mirrors and gratings. Using a stitching approach, the system will provide full-aperture measurements of curved and flat surfaces, with sub-nanometre accuracy over lengths up to 0.75 m. The system will integrate a stable Fizeau interferometer with a motorized, multi-axis positioning platform, enabling automated scanning and acquisition across large optical surfaces presented sideways. Surface maps will be reconstructed from individual sub-aperture measurements using advanced algorithms, including using the PyLost software developed at ESRF. The design focuses on minimizing environmental noise, optical aberrations, and mechanical drift to ensure repeatable and reliable measurements. At MAX IV, the system will strengthen in-house capabilities in optical metrology. It will support the inspection of new mirror substrates before installation, the monitoring of ageing optics already in operation, and the optimization of mounting strategies.

Author

Maxime Lebugle (MAX IV Laboratory)

Co-authors

Louisa Pickworth (MAX IV Laboratory) Johan Selberg (MAX IV Laboratory) Marcelo Alcocer (MAX IV Laboratory) Margit Andersson (MAX IV Laboratory) Peter Sondhauss (MAX IV Laboratory) Johan Adell (MAX IV Laboratory) Joaquín González Fernández (MAX IV Laboratory)

Presentation materials

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