Speaker
Vijay Chouhan
(Fermi National Accelerator Laboratory)
Description
Fermilab has optimized the surface processing conditions for PIP-II high beta 650 MHz cavities. This encompasses conditions for bulk electropolishing, heat treatment, nitrogen doping, post-doping final electropolishing, and post-processing surface rinsing. The technology has been effectively transitioned to industry. This paper highlights the efforts made to fine-tune the process and to smoothly share them with the partner labs and an associated vendor.
Primary author
Vijay Chouhan
(Fermi National Accelerator Laboratory)
Co-authors
Alexandr Netepenko
(Fermi National Accelerator Laboratory)
Ambra Gresele
(Zanon Research & Innovation)
Andrii Tsymbaliuk
(Zanon Research & Innovation)
Anna Shabalina
(Science and Technology Facilities Council)
Damon Bice
(Fermi National Accelerator Laboratory)
Donato Passarelli
(Fermi National Accelerator Laboratory)
Genfa Wu
(Fermi National Accelerator Laboratory)
Grigory Eremeev
(Fermi National Accelerator Laboratory)
HyeKyoung Park
(Fermi National Accelerator Laboratory)
Joseph Ozelis
(Fermi National Accelerator Laboratory)
Paolo Barbero
(Zanon Research & Innovation)
Saravan Kumar Chandrasekaran
(Fermi National Accelerator Laboratory)
