23–28 Aug 2026
America/Los_Angeles timezone

A Compact 13.5-nm LPA-Driven FEL Based on a 6-m Integrated-Focusing FNAPU

WEP03
26 Aug 2026, 17:00
1h
Poster Presentation Session 11: Undulators and Photon Beamline Instrumentation Wednesday Poster Session

Speaker

Maofei Qian (Argonne National Laboratory)

Description

A 13.5-nm SASE FEL based on a force-neutral, phase-adjustable undulator (FNAPU) with integrated FODO focusing has been simulated. For an undulator period of 28 mm and K = 2.32, simulations assuming a 1-GeV electron beam with 0.5-mm·mrad normalized emittance and 3-kA peak current show that the integrated focusing maintains an rms beam size of approximately 20 μm, enabling saturation in about 6 m with a peak power of ~15 GW. This short saturation length removes the need for undulator segmentation, while the integrated focusing eliminates the need for external quadrupole magnets, enabling operation with a single undulator in a highly compact FEL configuration. The concept is well suited to laser-plasma-accelerator drivers and offers a promising route toward compact FEL facilities with potential applications in semiconductor lithography.

Funding Agency

Work supported by the U.S. DOE Office of Science-Basic Energy Sciences, under Contract No. DEAC02-06CH11357.

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Author

Maofei Qian (Argonne National Laboratory)

Co-author

Joseph Xu (Argonne National Laboratory)

Presentation materials

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