Speaker
Yosuke Honda
(High Energy Accelerator Research Organization)
Description
Energy-Recovery Linac (ERL) based Free-Electron Laser (FEL) has been a promising solution for the high-power EUV light source for future semiconductor lithography. KEK has been developing the key components of the accelerator system and designing the prototype machine. Beam optics design is important for realizing the required beam performance in the FEL section, for safely transport the beam to the dump, and for recovering the energy ideally. We will present various items considered in the designing work.
Funding Agency
This work was supported by JST K-Program Japan Grant Number JPMJKP24M2
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Author
Yosuke Honda
(High Energy Accelerator Research Organization)