Speaker
Ji Qiang
(Lawrence Berkeley National Laboratory)
Description
Lithography is a critical component of chip manufacturing in the semiconductor industry. The conventional laser-produced plasma (LPP) approach is energy-inefficient and poses potential environmental issues. In contrast, an energy recovery linac (ERL) based free-electron laser (FEL) offers a cleaner, more efficient alternative by recycling electron beam energy after FEL radiation. In this paper, we propose a compact ERL-based FEL that fits within a single building. We will report preliminary beam dynamics simulation results and discuss the potential challenges and future work required to develop such a facility.
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Author
Ji Qiang
(Lawrence Berkeley National Laboratory)