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1–6 Jun 2025
Taipei International Convention Center (TICC)
Asia/Taipei timezone

Sputtering characteristics of a compact NEG-coating device and performance evaluation of the TiZrV thin films

THPB008
5 Jun 2025, 15:30
2h
Exhibiton Hall A _Bear (TWTC)

Exhibiton Hall A _Bear

TWTC

Poster Presentation MC7.T14 Vacuum Technology Thursday Poster Session

Speaker

Ruau Watanabe (The Graduate University for Advanced Studies, SOKENDAI)

Description

Non-evaporable Getter (NEG) coating is a breakthrough technology wherein the inner walls of a vacuum chamber are coated with a material that functions as a vacuum pump. This technology is expected to gain widespread adoption across various fields in the future. However, the current coating method, originally developed for long beam ducts, is not adaptable to a wide range of vacuum chamber designs. Therefore, we have developed a compact NEG coating device that can be adapted to chambers of various geometries. The primary advantage of this device is its ability to coat complex-shaped chambers, which was difficult with conventional methods. Additionally, by reducing the uncoated surfaces as much as possible, it significantly improves pumping performance in terms of pumping speed and reducing Photon Stimulated Desorption (PSD) yields. We explore the optimal sputtering conditions for depositing high-performance NEG thin films with the device, and have performance evaluations of the NEG films, with observing the morphologies, measuring the pumping speed and PSD yields.

Region represented Asia
Paper preparation format LaTeX

Author

Ruau Watanabe (The Graduate University for Advanced Studies, SOKENDAI)

Co-authors

Yasunori Tanimoto (High Energy Accelerator Research Organization) Takashi Uchiyama (High Energy Accelerator Research Organization) Xiuguang Jin (High Energy Accelerator Research Organization) Tohru Honda (High Energy Accelerator Research Organization)

Presentation materials

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