1–6 Jun 2025
Taipei International Convention Center (TICC)
Asia/Taipei timezone

Antechamber type vacuum chamber coated with non-evaporable getter films

THPB080
5 Jun 2025, 15:30
2h
Exhibiton Hall A _Bear (TWTC)

Exhibiton Hall A _Bear

TWTC

Poster Presentation MC7.T14 Vacuum Technology Thursday Poster Session

Speaker

Wenli Zhang (University of Science and Technology of China)

Description

To coat the inner surface of antechamber type vacuum chamber for Hefei Advanced Light Facility (HALF) with nonevaporable getter material (NEG), a dedicated magnetron sputtering setup has been prepared at National Synchrotron Radiation Laboratory (NSRL). The magnetron sputtering device and the coating method are introduced in this paper. The properties of the films were tested. This coating method has been proved to be feasible and ensures the stability of the discharge and the reliability of the NEG film quality, which satisfy the stringent engineering requirements of HALF. This study may also offer a reference for similar vacuum chamber coating applications.

Region represented Asia
Paper preparation format Word

Author

BoWen Yao (University of Science and Technology of China)

Co-authors

Tao Huang (University of Science and Technology of China) Wenli Zhang (University of Science and Technology of China) Xinming Song (University of Science and Technology of China) Le Fan (University of Science and Technology of China) Yuanzhi Hong (University of Science and Technology of China) Gangqiang Ma (University of Science and Technology of China) Sihui Wang (University of Science and Technology of China) Xiaoqin Ge (University of Science and Technology of China) Yong Wang (University of Science and Technology of China)

Presentation materials

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