Speakers
Wenli Zhang
(University of Science and Technology of China)Dr
Baoyuan Bian
(High Energy Accelerator Research Organization)
Description
To coat the inner surface of antechamber type vacuum chamber for Hefei Advanced Light Facility (HALF) with nonevaporable getter material (NEG), a dedicated magnetron sputtering setup has been prepared at National Synchrotron Radiation Laboratory (NSRL). The magnetron sputtering device and the coating method are introduced in this paper. The properties of the films were tested. This coating method has been proved to be feasible and ensures the stability of the discharge and the reliability of the NEG film quality, which satisfy the stringent engineering requirements of HALF. This study may also offer a reference for similar vacuum chamber coating applications.
| Region represented | Asia |
|---|---|
| Paper preparation format | Word |
Author
BoWen Yao
(University of Science and Technology of China)
Co-authors
Tao Huang
(University of Science and Technology of China)
Wenli Zhang
(University of Science and Technology of China)
Xinming Song
(University of Science and Technology of China)
Le Fan
(University of Science and Technology of China)
Yuanzhi Hong
(University of Science and Technology of China)
Gangqiang Ma
(University of Science and Technology of China)
Sihui Wang
(University of Science and Technology of China)
Xiaoqin Ge
(University of Science and Technology of China)
Yong Wang
(University of Science and Technology of China)
Dr
Baoyuan Bian
(High Energy Accelerator Research Organization)
