1–6 Jun 2025
Taipei International Convention Center (TICC)
Asia/Taipei timezone

Atomic layer deposited ZnMgO multilayered coatings for TEEY and electrical conductivity optimization

WEPS054
4 Jun 2025, 16:00
2h
Exhibiton Hall A _Salmon (TWTC)

Exhibiton Hall A _Salmon

TWTC

Poster Presentation MC5.D12 Electron Cloud and Trapped Ion Effects Wednesday Poster Session

Speaker

Mathieu Lafarie (The French Aerospace lab)

Description

Total electron emission yield (TEEY), defined as the number of electrons emitted per incident electron of a given energy, is potentially the source of two major problems: electrostatic discharges (ESD) in vacuum and multipacting effect. To mitigate these risks, a possible solution could be to coat the surfaces prone to ESD or multipacting originate with a thin film with tunable TEEY and electrical conductivity. In order to be able to control both properties independently, a possible solution is to develop a thin film heterostructure based on the mixing of a low TEEY, electrical conductor material with a high TEEY, dielectric material in order, for instance, to obtain a low TEEY, dielectric coating that will prevent both Multipacting and a decrease of surface losses quality factor. We choose the Atomic Layer Deposition (ALD) method to achieve that goal and we will present results obtained with coatings made of multiple layers of ZnO and MgO to verify that this solution is relevant. Electrical conductivity and TEEY measurements carried out on these multimaterial multilayered coatings have shown that both properties vary according to their composition and their structure.

Region represented Europe
Paper preparation format Word

Author

Mathieu Lafarie (The French Aerospace lab)

Presentation materials

There are no materials yet.