Speaker
Description
The production of mA-level high-intensity, highly charged pulsed ion beams is a key technology for the development of advanced heavy-ion synchrotrons. By utilizing the afterglow mode of an ECR ion source (ECRIS), pulsed ion beams can be produced with peak intensities several times higher than those in the conventional continuous-wave (CW) mode, and the application of a pulsed biased disk voltage in the afterglow mode can further enhance the pulsed beam intensity. In this paper, an experimental study combining a pulsed biased disk with the afterglow mode was conducted on the SECRAL-IV ion source. A Bi³¹⁺ ion beam with a peak intensity of 1 mA was obtained and successfully delivered to the downstream accelerator, enabling the accumulated ion beam in the HIAF-BRing to reach 3.166 × 10¹⁰ particles per pulse (ppp).
Funding Agency
NSFC 12505188
| Classification | MC1: New developments and status reports |
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